Modelling of Microfabrication Systems

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Springer Science & Business Media, Jun 13, 2003 - Technology & Engineering - 270 pages
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This is the first book to address modelling of systems that are important to the fabrication of three-dimensional microstructures. It is unique in that it focuses on high aspect ratio microtechnology, ranging from ion beam micromachining to x-ray lithography.

 

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Contents

Ion Beam
1
12 Large Area Sputter Modeling
2
13 Focused Ion Beam
14
Xray Lithography
29
22 Mask Heating and Distortion
30
23 Thermal Analysis of Resist
47
24 Microstructure Transfer Accuracy
63
Laser Chemical Vapor Deposition
77
Laser Ablation
159
52 Photothermal Models
160
53 Photochemical Models
176
54 Photophysical and Other Models
187
55 High Energy Density Laser Models
210
Thin Films
221
62 Heat Transport Models at the Microscale
222
63 PhaseLag Models
229

32 Kinetically Limited Deposition
78
33 Mass Transport Limited Deposition
103
Laser Photopolymerization
123
42 Kinetics of Photopolymerization
124
43 Photofabrication
140
44 Process Models
150
64 Solution Methods
232
65 ShortPulse Laser Heating of Thin Films
238
References
249
Index
263
Copyright

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Page 251 - A process model for nonisothermal photopolymerization with a laser light source II. Behavior in the vicinity of a moving exposed region.
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Page 257 - Effect of optical pulse duration on the XeCl laser ablation of polymers and biological tissue, Appl.