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Macleod H A USA
Vaporphase Mixed Deposition of Optical
Pressure and Evaporation Power Control for the Obtainment
40 other sections not shown
absorption Academia Sinica angle antireflection coating Appl applications argon assisted deposition CaF2 thin film calculated carbon cermet China coefficient current density curves damage threshold dependence dielectric diode DLC film effect electron electron beam evaporation energy evaporation experimental results Fig.l film thickness films deposited glass improved incident increase inhomogeneous Institute of Optics interface ion beam ion bombardment ion plating ion source ion-assisted deposition laser laser damage laser-induced damage layer lead telluride measured mechanical metal film method MgF2 microstructure mixed films monitoring multilayer obtained optical coatings optical constants optical properties optical thin films oxide oxygen packing density parameters phase Phys Physical Vapor Deposition Physics plasma pressure pulse Raman reactive reflectance refractive index sample scattering Shanghai Institute shown spectral sputtering structure substrate substrate temperature surface technique Technology thermal Thin Solid Films transmission transmittance vacuum vanadium dioxide Wang wavelength X-ray