Principles of Lithography

Front Cover
SPIE Press, 2005 - Technology & Engineering - 423 pages
2 Reviews
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
 

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Contents

Overview of lithography
1
Optical pattern formation
7
Photoresists
53
Modeling and thin film effects
99
Wafer steppers 139
139
Overlay 199
199
Masks and reticles
243
Confronting the diffraction limit
273
Metrology
313
The limits of optical lithography
331
Lithography costs
355
Alternative lithography techniques
375
Coherence
413
Index419
419
Copyright

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