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A translation of Zhurnal Prikladnoi Khimii
Plasmochemical Deposition of Silicon Nitride Films in the SiH4ArN2 System
Recovery and Accumulation of HighPurity Hydrogen with the Use
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1995 Plenum Publishing a-hydroxy per ester acetate acid activated carbon active adsorption alloys amines anion anodic aqueous solutions butane calculated carbon carboxylic acids catalyst cathodic Chem chemical Chemistry chloride coefficient complexes composition compounds concentration copolymer corrosion crystal current density curves decreases dependence determined diffusion elec electrochemical electrode electrodeposits electrolyte equation ester experimental extraction film formation formed fraction fullerene gallium(III glass graphite hafnium hydrogen increases initial ion exchanger issues)/ISSN Khim Khimiya kinetics layer lead battery lead(II lignins melt metal method mixture mole molecular molecules Moscow obtained Original article submitted oxide parameters particles phase Plenum Publishing Corporation polymer polymerization porous potential Prikl ratio reaction rhodium rhodium(III RUSSIAN JOURNAL salt samples six issues sodium solubility sorption spectra studied sulfuric sulfuric acid surface Table temperature tion Translated from Zhurnal values viscosity Volume Zhurnal Prikladnoi Khimii