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GRATINGS FABRICATED BY SCANNING ELECTRON
HOLOGRAPHIC PHOTORESIST GRATINGS
LIQUID PHASE EPITAXIAL GROWTH
4 other sections not shown
Chapter cleaved edge CROSS SECTION DFB lasers diffracted beam diode distributed Bragg reflector DOPANT DOPING CONCENTRATION dummy substrates dye laser electron resist electron-resist gratings emission epitaxial growth epitaxial layer ETCHED GRATING experimental setup exposure and development FIGURE TITLE fringe GaAlAs GaAs samples GaAs-GaAlAs HETEROSTRUCTURE Gaussian beam GRATING FABRICATION GRATING IN GaAs grating masks gratings of period growth over corrugated growth system heterostructures holographic photoresist gratings II-l III-l injection lasers integrated optical circuit interface ion-beam milling lasing lateral uniformity light intensity liquid phase epitaxial LPE growth measured melt MICROGRAPH OF CROSS MICROGRAPH OF TOPVIEW micron mode optical gratings OPTICAL MICROGRAPH optical pumping optimum periodic corrugation periodic structures photoresist film plane PMM GRATING preferential chemical etching radiation modes reflected SCANNING ELECTRON MICROGRAPH scanning electron microscope SCHEMATIC DIAGRAM shown in Figure solution standing-wave pattern strate submicron gratings supercooling technique TEMqq Gaussian beam thickness thin-film optical TOPVIEW variation wavelength