Thin Film Processes II

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Academic Press, Dec 2, 2012 - Technology & Engineering - 888 pages
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This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques.
  • Provides an all-new sequel to the 1978 classic, Thin Film Processes
  • Introduces new topics, and several key topics presented in the original volume are updated
  • Emphasizes practical applications of major thin film deposition and etching processes
  • Helps readers find the appropriate technology for a particular application
 

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Thin Film Processes II
Werner Kern - Technology & Engineering - 2012 - 888 pages
This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film
deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Key Features * Provides an all-new sequel to the 1978 classic, Thin Film Processes * Introduces new topics, and several key topics presented in the original volume are updated * Emphasizes practical applications of major thin film deposition and etching processes * Helps readers find the appropriate technology for a particular application
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Contents

Part III
281
Part IV
523
Part V
671

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About the author (2012)

Werner Kern is president of Werner Kern Associates, a consulting firm for Semiconductor Materials Processing. From 1959-1987, he was a scientist at the RCA David Sarnoff Research Center in Princeton, New Jersey as a Fellow of the Technical Staff. While at RCA he developed the RCA Standard Clean Process for silicon wafer cleaning, which in its various forms is still used worldwide after nearly 40 years. In 1988 he joined Lam Research Corporation as a Senior Scientist and currently opened his own consulting company.


Werner Kern is the holder of 11 US Patents and is the author and co-author of over 150 scientific publications. He is the editor of four technical books, is an Emeritus Fellow of the Electrochemical Society, and an Emeritus Member of the American Vacuum Society. He is the recipient of three RCA Outstanding Achievement Awards and the Callinan Award from the Electrochemical Societys Dielectric Science Division. Several additional awards include a NASA Recognition in 1981, the prestigious 1997 SEMI Award for his lifetime contributions to the semiconductor industry, and the SCP Global Technologies Inc. the Werner Kern Award, which was founded in his honor for technical excellence in 1999.

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