What people are saying - Write a review
We haven't found any reviews in the usual places.
DEPOSITION AND CHARACTERIZATION I
DEPOSITION AND CHARACTERIZATION II
DEVICES AND APPLICATIONS I
3 other sections not shown
absorption edge aluminum analysis angle antireflection coating Appl argon Bacteriorhodopsin C-axis calculated coefficient crystallite curve dependence deposited film devices diacetylene dielectric diffraction electron electron beam evaporation energy gap epitaxial evaporated experimental fabrication Figure film thickness films deposited filters France FWHM garnet growth holograms impurities incident InP substrates intensity interface investigated ion beam deposited ion beam sputtered ion plating laser mirrors layer light mask matrix maximum measured monolayers nonlinear Nonlinear Optics obtained optical bistability optical coating optical properties orientation oxide oxygen parameters PbTe coating PbTe material peak Phys planar plasma PM-films polarization produced proton range reflow refractive index rms roughness rotation sample sapphire scattering shows silicon single crystal SiO2 SiO2 films spectral sputter deposition structure stylus substrate substrate temperature surface Ta2Oa Ta2Os target Te-enriched technique thermal thickness profile Thin Solid Films tin dioxide transmission transmittance TRFA wavelength X-ray zirconium ZnO films