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Proposed methodology for characterization of microroughnessinduced optical scatter
Selection of calibration particles for scanning surface inspection systems 286215
a comparative study with atomic force microscopy
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angle applications bandwidth beam becomes BRDF calculated calibration characterization compared comparison components contamination corresponding cross section curve dependence detection detector determined developed diameter direction display distribution effects equation equipment example experimental factor fiber field Figure flatness function geometry given grating haze important incident industry inspection instrument integrated intensity laser length light scattering limit manufacturing material matrix mean measurement method metrology microroughness microscope models observed obtained optical parameters particle pattern pits plane polarization polished present production range reference reflection region reported respect response roughness sample scale scan scattered light semiconductor sensor shown shows signal silicon wafer spatial frequency specifications specular spheres SPIE SSIS standard step substrate Supplier surface surface roughness techniques thickness values various wavelength