In-Situ Patterning:: Volume 158: Selective Area Deposition and EtchingAnthony F. Bernhardt, Jerry G. Black, Robert Rosenberg The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners. |
Contents
THEIR | 3 |
MECHANISM OF CHROMIUM DEPOSITION FROM Cr CO 6 BY UV LASER | 27 |
SELECTIVE SURFACE MODIFICATION OF FLUOROCARBON RESIN USING | 33 |
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1990 Materials Research ablation absorption adsorbed AlGaAs annealing Appl atoms azobenzene CdTe chemical chemical vapor deposition chlorine Cl₂ copper copper chloride damage decomposition deposition rate depth desorption devices diffusion DMAH dopant doping electron epitaxial etch rate excimer laser experimental exposure fabricated Figure fluence GaAs gas phase germanium growth rate heating HEMT hydrogen implanted increase intensity ion beam ion implantation irradiation ISBN laser beam laser fluence laser power laser pulse laser-induced layer Lett Materials Research Society mbar measured melting metal mJ/cm² molecules observed optical oxide palladium acetate patterning peak photon photoresist Phys planarization plasma PMMA polyimide polymer pressure Proc reaction reactive region resistance sample scan selective semiconductor shown in Fig shows silicon SiO2 spectra sputtering structures substrate substrate temperature surface Symp technique Technol thermal thin films Torr transistors trench tungsten Volume wafer wavelength