Advances in Mirror Technology for X-ray, EUV Lithography, Laser and Other ApplicationsSPIE, 2004 - Lasers |
Contents
Fabrication of aspherical mirrors for EUV projection optics set3 of HINA 553303 | 10 |
a challenge for optical metrology 553304 | 20 |
Recent progress of EUV wavefront metrology in EUVA 553305 | 27 |
Copyright | |
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Common terms and phrases
accuracy Advances in Mirror alignment anticlastic aperture asphere beamline bending calculated collector corrector density deposition diffraction electroforming ellipsoid elliptical mirrors EUV Lithography EUV reflectance EUV source EUV tube Extreme Ultraviolet Lithography fabrication figure error Fizeau interferometer focal focusing glancing angle grating grazing incidence hard X-ray incidence angle interferometer Kazuya Ota Khounsary laser mandrel master mandrel metrology microscopic mirror shells mirror surface Mirror Technology Mo/Si multilayer multilayer coatings multilayer mirror nm rms numerical aperture obtained parameters PCVM performed pinhole plane plasma plasma spray polishing Proc Proceedings of SPIE projection optics pulsed laser deposition pyrex radiation radius ray trace replication sample Schwarzschild objective shown in Fig shows silicon soft X-ray SPIE Spring-8 stitching substrate surface profile surface roughness synchrotron Tamasaku target Technology for X-Ray temperature thermal thickness Udo Dinger wafer wave wavefront error wavelength Wolter mirror x-ray microscopes X-ray mirrors X-ray optics Yabashi