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SCATTERING AND IMPLANTATION PROFILES
MonteCarlo simulation of positron slowing down in aluminium
Positron slowing down and surface processes
18 other sections not shown
analysis annealing annihilation Appl approach approximation assumed atoms Auger backscattering bulk calculated concentration constant core correlation corresponding cross section defect density dependence depth described detailed determined diffusion discussed distribution effects elastic scattering electric field electron emission enhancement epilayers equation estimated excitation experimental experiments Figure fitting follows formation fraction function GaAs give given higher implantation incident increase indicate intensity interface Jensen K.G. Lynn layer Lett magnetic material mean measurements metal method Nieminen observed obtained Ontario PAES parameter particle peak Phys Physics position positron annihilation positron beam positron energy possible potential present probability range reference region respectively sample scattering Schultz shown in Fig shows silicon slow positron solid spectra stopping structure surface technique temperature thermal transition transport trapping University values voids wavefunctions yield