10 Years of Advancing the Science of Semiconductor Manufacturing Excellence

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IEEE, 1999 - Process control - 455 pages

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Contents

Systematic and Random Defect Reduction During the Evolution of Integrated Circuit Technology
2
Real Time Failure Analysis of Cu Interconnect Defectivity Through Bitmap Overlay Analysis
8
Vikas R Sheth Hai Nguyen Patrick Dao A Mark Miscione APRDL Motorola
14
Copyright

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