Microphotography: fundamentals and applications : [symposium], Thursday and Friday April 3-4, 1968, Colonial Statler Hilton Inn, Wakefield, Massachusetts |
What people are saying - Write a review
We haven't found any reviews in the usual places.
Contents
OPTICAL SYSTEMS FOR MICROPHOTOGRAPHY | 1 |
OPTICAL CHARACTERISTICS AFFECTING THE PERFORMANCE | 13 |
LOW DISTORTION LENSES FOR MICROPHOTOGRAPHY | 33 |
5 other sections not shown
Common terms and phrases
aberrations alignment Aperture card application axis bits camera cathode ray tube characteristics circuit coating color components contrast copy curve density diazo diffraction diffuse double-Gauss Electrofax electronic Electrophotography emulsion energy equipment error exposed exposure f-number field flashtube focal focus formation gamma graphic high resolution illumination inches integrated circuits Itek Kalvar film Kalvar materials Kodak layer lens lenses leuco dye light source limited line width lines per millimeter lines/mm magnification manufacturers mask measurement method micro-images microelectronics microfilm micrometer microns microphotography millimeter modulation modulation transfer function negative obtained operation optical output paper pattern Photo resists photoconductor Photographic Science photosensitive printing problem production projection pulse reduction relative resolving power reticles sensitive shown in Figure silver halide spectral speed SPSE step and repeat storage target techniques tube ultrafiche wavelength Xenon xenon flash
Bibliographic information
| Title | Microphotography: fundamentals and applications : [symposium], Thursday and Friday April 3-4, 1968, Colonial Statler Hilton Inn, Wakefield, Massachusetts |
| Author | Society of Photographic Scientists and Engineers. Boston Chapter |
| Publisher | Society of Photographic Scientists & Engineers, 1969 |
| Length | 238 pages |
| Subjects | › Microphotography Photography / General |
| Export Citation | BiBTeX EndNote RefMan |