Low-dielectric Constant Materials IV: Symposium Held April 14-16, 1998, San Francisco, California, U.S.A., Volume 4The 49 papers focus on the areas of polymeric and inorganic low-k dielectrics, metrology and materials characterization, the process integration of low-k interconnects, and the reliability of low-k dielectrics. Among other topics, the invited papers discuss fundamental aspects of polymer metallization, ion-beam techniques for characterizing low-k materials, low-dielectric constant materials integration challenges, integration issues for diamond-like carbon in a copper damascene process flow, and the chemical-mechanical planarization of the polymer interlayer dielectrics. Annotation copyrighted by Book News, Inc., Portland, OR |
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Bibliographic information
| Title | Low-dielectric Constant Materials IV: Symposium Held April 14-16, 1998, San Francisco, California, U.S.A., Volume 4 Volume 511 of Materials Research Society symposia proceedings, Materials Research Society, ISSN 0272-9172 Volume 511 of Materials Research Society symposium proceedings: Materials Research Society Volume 511 of Materials Research Society: Materials Research Society symposia proceedings |
| Editors | Chien Chiang, P. S. Ho |
| Contributors | Ch ʼien Chiang, Qian Jiang |
| Publisher | Materials Research Society, 1998 |
| ISBN | 1558994173, 9781558994171 |
| Length | 386 pages |
| Subjects | › › Technology & Engineering / Electronics / General |
| Export Citation | BiBTeX EndNote RefMan |