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alignment alternating phase shifting areas auxiliary patterns average capability chrome chromeless phase-shifting coherence contrast critical dimension dark-field gratings Descum deviation device distortion dose E-beam lithography E-D trees EBES4 edge detection electric field electron beam electron beam lithography Etch Etec Etec Systems exposure dosage Figure focus focused ion beam GHOST grid improvement laser layer lens lines and spaces linewidth control lithography tool machine manufacturing MEBES method metrology Microlithography micron MPVA Nikon 3i opaque operation optical lithography ortho parameters particle pattern edge pellicles performance phase-shifter lines phase-shifting mask Photolithography photomask photoresist placement accuracy plate product emulation proximity effect range raster scan reduced registration measurement repair resolution reticle run in/out semiconductor shifter shifting mask shown in Fig shows sigma simulation specifications SPIE stepper Strip Subresolution substrate technique throughput tungsten unattenuated phase shifting variable Vendor wafer width X-ray mask X/NA