Journal of Micro/nanolithography, MEMS, and MOEMS: JM3, Volume 7 |
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actuator adaptive optics angle applied attenuation beam calculated cavity cell chip correction defined deformable mirror density device diffraction dose effect electrical electrode electron Engineering etch experimental exposure fabrication fiber field figure film filter first fit fixed flow frequency grating IEEE immersion lithography laser laser diode layer lens linewidth lithography mask materials measured mechanical membrane MEMS method micro microelectromechanical systems micromachining micromirror mirror module MOEMS nanowire optical optimization paper parameters pattem photomask photon photoresist Phys pitch pixels planarization PMGI PMMA polarization polymer profile pulse QSPR ratio reflectance refractive index resin resist resonance sample scanner scanning sensor shown in Fig shows significant silicon simulation solution specific spectral SPIE stress structures substrate surface target technique temperature thermal thickness tion University values voltage wafer wavelength width z-pinch