Journal of Micro/nanolithography, MEMS, and MOEMS: JM3, Volume 7SPIE-The International Society for Optical Engineering, 2008 - Microelectronics |
Common terms and phrases
actuator angle applications attenuation beam calculated cavity cell chip correction deformable mirror density device diffraction displacement dose effect electrical electrode electron Engineering etch experimental exposure fabrication fiber Figure film flip chip frequency grating IEEE immersion lithography increase KLUP laser laser diode layer lens linear linewidth lithography mask materials measured mechanical membrane MEMS metal method micro microelectromechanical systems microfluidic micromachined micromirror mirror module MOEMS nanowire optical optimization oxide paper parameters pattern photomask Photonics photoresist Phys pitch pixels planarization plasma plate PMGI PMMA polarization polymer Proc pulse QSPR ratio reflectance refractive index resin resist resonance sample scanner scanning sensor shown in Fig shows silicon simulation solution spectral SPIE stress structures substrate surface target technique temperature thermal thickness tion University values voltage wafer wavelength width z-pinch