Journal of Micro/nanolithography, MEMS, and MOEMS: JM3, Volume 7SPIE-The International Society for Optical Engineering, 2008 - Microelectronics |
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Results 1-3 of 13
Page 6
... ( z - pinch ) Flow Z - Pinch experiment is studying the effect of sheared flow on gross plasma stability . In the ex- periment , hydrogen gas is used to produce plasma with quiescent peri- ods in the magnetic mode activity , which are ...
... ( z - pinch ) Flow Z - Pinch experiment is studying the effect of sheared flow on gross plasma stability . In the ex- periment , hydrogen gas is used to produce plasma with quiescent peri- ods in the magnetic mode activity , which are ...
Page 7
... pinch in the 100 - cm - long assembly region . Fig . 4 Imacon photographs of a xenon z -. Acceleration Region 1 Neutral Gas Injection Plane Inner Electrode Outer Electrode Assembly Region z = 0 Vacuum Vessel 1 m Electrode End Wall 8,9 ...
... pinch in the 100 - cm - long assembly region . Fig . 4 Imacon photographs of a xenon z -. Acceleration Region 1 Neutral Gas Injection Plane Inner Electrode Outer Electrode Assembly Region z = 0 Vacuum Vessel 1 m Electrode End Wall 8,9 ...
Page 8
... z - pinch begins to form as a column of plasma . Current flowing in the z - pinch generates an azimuthal magnetic field that pinches down on the plasma column until the plasma pressure balances the magnetic pressure . ( d ) The z - pinch ...
... z - pinch begins to form as a column of plasma . Current flowing in the z - pinch generates an azimuthal magnetic field that pinches down on the plasma column until the plasma pressure balances the magnetic pressure . ( d ) The z - pinch ...
Common terms and phrases
actuator angle applications attenuation beam calculated cavity cell chip correction deformable mirror density device diffraction displacement dose effect electrical electrode electron Engineering etch experimental exposure fabrication fiber Figure film flip chip frequency grating IEEE immersion lithography increase KLUP laser laser diode layer lens linear linewidth lithography mask materials measured mechanical membrane MEMS metal method micro microelectromechanical systems microfluidic micromachined micromirror mirror module MOEMS nanowire optical optimization oxide paper parameters pattern photomask Photonics photoresist Phys pitch pixels planarization plasma plate PMGI PMMA polarization polymer Proc pulse QSPR ratio reflectance refractive index resin resist resonance sample scanner scanning sensor shown in Fig shows silicon simulation solution spectral SPIE stress structures substrate surface target technique temperature thermal thickness tion University values voltage wafer wavelength width z-pinch