Handbook of Chemical Vapor Deposition: Principles, Technology and ApplicationsHandbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful. |
Contents
| 1 | |
| 17 | |
CHAPTER 3 THE CHEMISTRY OF CVD | 51 |
CHAPTER 4 CVD PROCESSES AND EQUIPMENT | 81 |
CHAPTER 5 THE CVD OF METALS | 126 |
CHAPTER 6 THE CVD OF NONMETALLIC ELEMENTS AND SEMICONDUCTORS | 163 |
CHAPTER 7 THE CVD OF CERAMIC MATERIALS | 198 |
CHAPTER 8 CVD IN ELECTRONIC APPLICATIONS | 272 |
CHAPTER 9 CVD IN OPTOELECTRONICS AND OTHER ELECTRONICALLY RELATED APPLICATIONS | 302 |
CHAPTER 10 CVD IN OPTICAL APPLICATIONS | 322 |
CHAPTER 11 CVD IN WEAR EROSION AND CORROSIONRESISTANT APPLICATIONS | 347 |
CHAPTER 12 CVD IN FIBER POWDER AND MONOLITHIC APPLICATIONS | 386 |
ALTERNATIVE PROCESSES FOR THINFILM DEPOSITION AND SURFACE MODIFICATION | 408 |
| 414 | |
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Handbook of Chemical Vapor Deposition (CVD): Principles, Technology, and ... Hugh O. Pierson No preview available - 1992 |
Common terms and phrases
Alkyl aluminum amorphous atmosphere atomic borides boundary layer carbon carbonyl ceramic Chapter Chemical Vapor Deposition chloride composites compounds Conf corrosion cubic Cullen cutting tools CVD G CVD process CVD Reactions decomposition density deposited by CVD deposition temperature devices diamond diborane dielectric diffusion electrical resistivity Electrochem electronic epitaxial experimental fibers g/cm³ gallium arsenide gases germanium graphite H₂ halides heat high temperature hydrogen hydrogen reduction indium kg/mm² laser CVD low pressure low temperature melting point metallo-organic MOCVD Molybdenum Niobium obtained optical optoelectronic oxidation resistance oxide oxygen Pennington photovoltaic plasma CVD powders precursors Proc produced by CVD properties pyrolysis reactants reactor refractory metal rhenium Section shown in Figure silane silicides silicon carbide silicon dioxide silicon nitride Spear and G sputtering structure substrate surface TABLE tantalum temperature range thermal conductivity thermal CVD thermal expansion thermodynamic Thin Films titanium Torr tungsten wear