Photomask Fabrication Technology

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McGraw Hill Professional, Aug 11, 2005 - Technology & Engineering - 500 pages
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Photomasks, the printing masters for the fabrication of integrated circuits, have become a necessity of modern semiconductor manufacturing. This book details the science and technology of industrial photo mask production, including fundamental principles, industrial production flows, and technological evolution.

 

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Contents

Chapter 2 Data Preparation
35
Chapter 3 Pattern Generation
55
Chapter 4 Photomask Pattern Transfer
177
Chapter 5 Photomask Metrology
261
Chapter 6 Process Back End and Defectivity Control
343
Chapter 7 Resolution Enhancement Techniques
425
Chapter 8 NGL Mask Technology Introduction
513
Index
565
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About the author (2005)

Benjamin G. Eynon, Jr., is Senior Director of Product Marketing at KLA-Tencor Corporation. He has more than 18 years of experience in wafer and photomask industry technology.

Banqiu Wu, Ph.D. is a Senior Staff Scientist at Photronics, Inc. He has expert-level photomask fabrication experience in the pattern transfer process.

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