Developments in Materials Characterization Technologies: Symposium Held 23 and 24 July 1995, During the 28th Annual Technical Meeting of the International Metallographic Society, Albuquerque, New Mexico, USA
George F. Vander Voort, John J. Friel
International Metallographic Society, Jan 1, 1996 - Technology & Engineering - 125 pages
A wide range of topics were covered at this symposium including case histories of materials characterization utilizing techniques such as LOM, SEM, TEM, and Auger. Plus there's a review of the many important refinements made to the light optical microscope. This 136-page book also looks at the development of powerful image analysis due to personnel computers and digital imaging technology, as well as new approaches for characterizing the spatial arrangement of fibers under directional fiber composites using image analysis. You'll find an overview of the many sources of structural, compositional, and crystallographic information obtainable with the scanning electron microscope. In addition to history of EDS development, there's a review of back scattered electron Kikuchi patterns generated with the SEM provided phase identification and crystal orientation. Analytical approaches for converting x-ray counts to chemical analysis results (EMPS), the development and transformation of the TEM microscope to AEM, and analytical electron and atom probe field ion microscopy are also discussed at great length.The theory of XRD residual stress measurements and the use of energy-dispersive spectroscopy for mapping chemistry over large areas are covered along with the unique aspects of Auger electrons that facilitate surface chemistry characterization.
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Alloy aluminum analyzer angle APFIM applications arrangement of fibers ASTM atom probe atomic number Auger backscattered backscattered electron BEKP calculated camera cathodes chemical widths contrast count rate crater crystal crystallographic detection detector diameter diffraction electron beam electron image electron microscope electron source elements example experimental field emission field-ion germanium grain areas grain boundary image analysis impact craters inclusions ingot instrument interfaces K-function layer lens maps metallographic metals methods microanalysis micrograph microprobe microstructural Murr nearest neighbor distribution neighbor distribution function objective lens obtained optical orientation particles patterns peak phase identification pixel plane precipitates processing quantitative radial distribution function range regions residual stress sample scanning scanning electron microscope sensitivity shot peened shown in Figure shows simulated spatial distribution spatial resolution specimen spectra spectrometers spectroscopy standard steels structure superalloy tantalum technique thin transmission electron Vander Voort voltage volume fraction X-ray yttrium