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Optical Metrology and Theory
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a-Si accurate angle of incidence approximately atomic force microscopy B/K-based model BEMA theory BEMA-based model bulk poly bulk thickness c-Si calibration changes characterization data acquisition detector effective medium ellipsometry equation error etch rate experimental reflectance experiments film properties light loop etch rate low frequency oscillations measurements method model parameters open loop optical constants optical models optically smooth oxide thickness pixel plasma poly Si bulk poly Si film poly Si sample poly Si thickness problem reactive ion reactive ion etching real-time reflectance data reflected intensity reflection amplitude coefficient refractive index regression routine rms roughness rms surface roughness rough interface rough surfaces roughness values sample surface scattered field scattering theory secondary reflectance sensor system shown in Figure Si02 thickness silicon dioxide single wavelength specular substrate surface morphology surface roughness layer thesis thickness noise thin film thickness transmission electron microscopy variables wafer wavelength XTEM