Semiconductor Manufacturing Technology
This textbook contains all the materials that an engineer needs to know to start a career in the semiconductor industry. It also provides readers with essential background information for semiconductor research. It is written by a professional who has been working in the field for over two decades and teaching the material to university students for the past 15 years. It includes process knowledge from raw material preparation to the passivation of chips in a modular format.
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2 BUILDING BLOCKS FOR INTEGRATED CIRCUITS
3 THERMAL OXIDATION
4 GAS KINETICS AND PLASMA PHYSICS
5 CHEMICAL VAPOR DEPOSITION
6 PLASMAENHANCED CHEMICAL VAPOR DEPOSITION AND ETCHING
8 PATTERN GENERATION
adsorbed aluminum ambient annealing approach atoms barrier barrier metal beam BPSG bulk capacitor cause chemical circuit cleaning collision copper crystal CVD reactor decreases defects demonstrated in Fig density deposition rate device manufacturing dielectric constant diffracted diffusion dissociation dopant doped drain electrical field electromigration electron energy etching process etching rates flow function gate oxide heating hole hydrogen illustrated in Fig increases ion implantation ionization lens light low-k magnetic field mask pattern material metal lines molecules NMOS optical p-type PECVD PEOX photolithography planarization plasma etching plasma system polycide polysilicon polysilicon gate pressure quartz ratio reaction resist result semiconductor semiconductor manufacturing shown in Fig sidewall silicide silicon nitride silicon oxide silicon surface solution sputtering step coverage stress structure substrate substrate surface target temperature thermal tion transistor tungsten tungsten silicide uniformity voltage wafer wafer surface wavelength wet etching