Introduction to Microlithography

Front Cover
L. F. Thompson, C. Grant Willson, M. J. Bowden
American Chemical Society, 1994 - Gravure par plasma - 527 pages
Updated and expanded! Reviews the theory, materials, and processes that are used in the lithographic process. Opens with a brief historical introduction to the advances in microlithography. Discusses four major topics: the physics of the lithographic process, organic resist materials, resist
processing, and plasma etching. Designed as a tutorial for researchers with no experience in the field, as well as those experienced in microlithography. Will also prove invaluable to those already involved in microlithography. Includes numerous references for more detailed reading on specific
aspects of microlithography.

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Contents

The Physics
19
Organic Resist Materials
139
Resist Processing
269
Copyright

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