Annual Symposium on Photomask Technology and Management: Proceedings, Volume 13SPIE--the International Society for Optical Engineering, 1994 - Integrated circuits |
Contents
Masks for MarkleDyson optics 208701 | 2 |
Flexure of photomasks in manufacturing and application 208708 | 18 |
CORE 2564 process optimization with the APTCON 4045 208709 | 30 |
Copyright | |
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Common terms and phrases
aerial image alignment alternating PSM aperture APTCON artifact attenuating PSM automated binary masks blank calibration chromium clamping contact hole coordinate patch cost database defocus deposition depth develop dose dry etch e-beam edge ESSONNES Etec Systems exposure feature focus grid halftone-rim i-line illumination image contrast improvement inspection intensity isolated laser layer lens lithography manufacturing mask fabrication measurement MEBES membrane method metrology micron micron technology microscope optical optical lithography optimized parameters pattern pellicle performance phase error phase shift masks phase-shifting Photolithography photomask photoresist pinhole pixel plate positioning accuracy printability probe proximity effects pwle quartz bump defect raster reduced repair resist resolution reticle rim PSM scanning SEMATECH sensitivity shifter shown in Figure simulation sizes SPIE stepper substrate SXPL technique TEST MASK thickness throughput transmission defects transmission error wafer wavelength wet etched