Microlithographic Techniques in Integrated Circuit FabricationSPIE, 2000 - Integrated circuits |
Contents
OPTICAL LITHOGRAPHIC SYSTEMS AND METROLOGY TECHNIQUES | 1 |
XRAY EBEAM AND ION BEAM LITHOGRAPHY | 7 |
a new tool for microlithography technology 422609 | 59 |
Copyright | |
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Common terms and phrases
aerial image alignment alt-PSM alternating PSM ArF excimer bake plate BARC best focus CD variation contact hole corner rounding diffractive micro-optical lens dipole dipole illumination dose compensation e-beam lithography effect electron beam lithography energy etch excimer laser exposed exposure feedforward feedforward control film gray scale improve Integrated Circuit intensity irradiation isolated lines KrF excimer laser light source linewidth linewidth control measured MEEF Micrascan micro-optical Microelectronic Microlithographic Techniques nanometre Nanotechnology optical constants optical lithography optimal parameters pattern PEB temperature performance photolithography photomask photoresist pitch plasma process latitude process window production proximity effects ratio resist thickness reticle scanning semiconductor shown in Figure silicon simulation slit slot sol-gel SPIE Vol spin coating substrate Techniques in Integrated technology file test structure throughput tool UVIII wavelength width x-ray lithography Xiaocong Yuan zone