Principles of Vapor Deposition of Thin Films
The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology.
Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible.
* Offers detailed derivation of important formulae.
* Thoroughly covers the basic principles of materials science that are important to any thin film preparation.
* Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.
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Chapter 03 PLASMA STATE
Chapter 04 COLD PLASMA DISCHARGES
Chapter 05 THERMAL EVAPORATION SOURCES
Chapter 06 GAS FLOW IN THIN FILM PROCESSING SYSTEMS
Chapter 07 SPECIAL SOURCES
Chapter 08 GAS SOLID INTERACTIONS
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Page 58 - I believe it is the atomic hypothesis (or the atomic fact, or whatever you wish to call it) that all things are made of atoms — little particles that move around in perpetual motion, attracting each other when they are a little distance apart, but repelling upon being squeezed into one another.