Laser Photoionization and Desorption Surface Analysis Techniques: 18-19 January 1990, Los Angeles, CaliforniaNicolas S. Nogar |
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Contents
SURFACE KINETICS AND MECHANISMS | 51 |
Volume 1208 | 54 |
INTERFACIAL DIAGNOSTICS | 105 |
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ablation laser adsorbed adsorption anisotropic annealed atoms Auger azimuthal angle bond branching ratio Chem chemisorption core coverage crystal Dâ‚‚ decomposition desorbed desorption detection deuterium dissociation distribution DMCA DMCd dopant dye laser dynamics electronic excitation experimental experiments Figure film fluence frequency FTIR function gas phase HCI v=0 heating rate increase induced infrared interaction ionization kinetic energy LAMMS laser ablation laser beam laser fluence laser irradiation laser pulse lateral diffusion Lett LITD signal mass spectrometer measurements molecular molecules monolayer neutral observed optical fibers overlayer peak photons Phys polarization population probe propylene pump ratio reaction relaxation REMPI rotational rotationally anisotropic S.M. George sample scattering sensitivity SH intensity shown in Fig silicide silicon surface species spectra spectroscopy spin-orbit sputtering stretching mode studies substrate Surf surface temperature technique temperature dependence thermal desorption transient transition velocity vibrational Vibrational energy relaxation wavelength yield