## Charged-particle Optics, Volume 4 |

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### Contents

Uniform largearea thermionic cathode for SCALPEL 377701 | 2 |

Insitu beam position monitoring system for electronbeam lithography 377703 | 15 |

Accurate ray tracing through finite element solved potential distributions in charged particle | 24 |

Copyright | |

5 other sections not shown

### Common terms and phrases

aberration coefficients aberration disk analyzer angle astigmatism axial field beam current Beam Software blur calculated cathode cell Charged Particle Optics chromatic aberration clamp computed configuration Coulomb interactions current density deflection deflector detector diameter direct ray-tracing disc e-beam electric field electron beam electron beam lithography electron gun electron optical emission current emitter energy spread equation extraction voltage field distribution finite element focal focusing fringing field function Gaussian image plane global space charge grid ion beam July 1999 SPIE landing positions lenses magnification ME-VAL mesh method mrad multipole Munro objective lens obtained octopole optical axis optical system optimization parameters paraxial ray pattern Pbody plot potential distribution projection system quadrupole radial radius ray tracing region rise distances scaling SCALPEL scan secondary electrons shaped beam shown in Figure shows simulation space charge spherical aberration throughput uniform Wehnelt Wien filter