Chemical Vapor DepositionJong-Hee Park, T. S. Sudarshan |
Contents
CVD Diamond DiamondLike Carbon and Carbonitride Coatings | 331 |
Chapter 11 | 379 |
Chapter 12 | 401 |
J H Park and W D | 418 |
J H Park and W D | 433 |
| 465 | |
Author Index | 481 |
Chapter 9 | 287 |
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Common terms and phrases
adhesion alloy anode applications Applied Physics atoms auxiliary phase BST films carbide carbon cathodic CCVD ceramic chemical potential Chemical Vapor Deposition coefficient composition concentration cracking CVD coated CVD process cyclopentadienyl decomposition decrease density deposition process deposition temperature Diamond and Related diamond coatings diamond film dielectric constant diffusion electrical electrochemical electrochemical cell electrode equilibrium films deposited flame formation gas phase graphite hydrogen increase interface Journal kinetics layer ligands mechanical metal microstructure MOCVD molecules mullite nickel nickelocene NiCp nucleation optimum overpotential oxide oxygen parameters parylene PEVD product PEVD reaction PEVD system plasma plasma polymerized polyimides polymerization polymers precursors preform pressure properties pyrolysis ratio reactant reactor Related Materials residual stresses sample Schematic sensor shown in Figure silicon solid electrolyte solid state ionic spin coated stability step structure substrate substrate temperature surface technique Technology thermal thermodynamic thickness thin films Torr transport vapor phase wafer
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