Charged-particle Optics, Volume 2SPIE, 1996 - Electron optics |
Contents
New theoretical approach to the selfcoordinated problem in chargedparticle optics | 136 |
ELECTRON AND IONBEAM LITHOGRAPHY INSPECTION AND APPLICATIONS | 146 |
Electronic image adjustment device for ebeam lithography 285816 | 156 |
2 other sections not shown
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Common terms and phrases
accuracy analytical angle axial field functions basic surfaces boundary calculated cathode cathode tip Charged Particle Optics coefficient matrix element column combined field lens components computation conformal mesh Coulomb interactions crossover mode crossover-limiting aperture cylindrical D₁ deflection deflectors detector dtot effects electric field electron beam lithography electron gun electron trajectories electrostatic emission emitter emitting energy equation error field distribution finite element method focussed ion beam FOFEM and SOFEM geometry hermite cubic image rotation integral Laplace polynomial expansion Laplace's equation Lencová magnetic field magnetic lens magnification mesh cell mesh layout mesh nodes mesh points mesh step multipole numerical objective lens obtained optical axis optical properties parameters pencil of rays plane POCAD point cathode pole-piece polynomial expansion potential distribution probe current quadrupole radial gap lens ray tracing region secondary electron shown in Figure shows space charge specimen SPIE symmetric voltage wehnelt Wien filter