Particles on surfaces 1: detection, adhesion, and removal
This work comprises the proceedings of the Fourth Symposium on Particles on Surfaces. Papers cover: adhesion-induced deformations of particles on surfaces; the use of atomic force microscopy in probing particle-particle adhesion; particle contamination in microelectronics, on spacecraft, and on optical surfaces; the role of air ionization in reducing surface contamination by particles in the cleanroom; abrasive blasting media for contamination-free deburring processes; and more.;The book is intended for physical, chemical, surface and colloid chemists, materials scientists; polymers, plastics, electrical and electronics, computer, chemical and mechanical engineers; and upper-level undergraduate and graduate students in these disciplines.
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Facts and Foibles
Effect of Chemical Cleaning Sequencing on Particle
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adhesion efficiency adhesion force aerosol aerosol particle angle average beam calculated carrier beads charge chemical chip surface clean room coating Colloid contact angle contamination curve density detection device dielectric dielectric function disk diskette distribution effect electric field electrode electrophotography electrostatic force electrostatic image force Equation experimental fiber film filter fluorocarbon force of adhesion frequency function Gaussian beam glass Hamaker coefficient histogram HMDS humidity impact increase interactions latex latex spheres layer liner liquid materials measurements mechanical megasonic metals method micron multipoles number of particles optical oxide particle adhesion particle count particle deposition particle diameter particle removal particle size photoresist PI film pixel range ratio remove particles Research resonator sample scan semiconductor shows signal silicon wafers soil solution substrate surfactants Table technique threshold toner toner particles transient errors ultrasonic vacuum values vapor voltage Waals Waals forces wafer surface