Fundamental Electron Interactions with Plasma Processing Gases

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Springer Science & Business Media, Dec 6, 2012 - Science - 781 pages
This volume deals with the basic knowledge and understanding of fundamental interactions of low energy electrons with molecules. It pro vides an up-to-date and comprehensive account of the fundamental in teractions of low-energy electrons with molecules of current interest in modern technology, especially the semiconductor industry. The primary electron-molecule interaction processes of elastic and in elastic electron scattering, electron-impact ionization, electron-impact dissociation, and electron attachment are discussed, and state-of-the art authoritative data on the cross sections of these processes as well as on rate and transport coefficients are provided. This fundamental knowledge has been obtained by us over the last eight years through a critical review and comprehensive assessment of "all" available data on low-energy electron collisions with plasma processing gases which we conducted at the National Institute of Standards and Technology (NIST). Data from this work were originally published in the Journal of Physical and Chemical Reference Data, and have been updated and expanded here. The fundamental electron-molecule interaction processes are discussed in Chapter 1. The cross sections and rate coefficients most often used to describe these interactions are defined in Chapter 2, where some recent advances in the methods employed for their measurement or calculation are outlined. The methodology we adopted for the critical evaluation, synthesis, and assessment of the existing data is described in Chapter 3. The critically assessed data and recommended or suggested cross sections and rate and transport coefficients for ten plasma etching gases are presented and discussed in Chapters 4, 5, and 6.
 

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Contents

ELECTRON INTERACTIONS WITH Cl2 CCl2F2 BCl3
52
ELECTRONMOLECULE INTERACTIONS IN
61
BoltzmannCodeGenerated Collision CrossSection Sets
100
SYNTHESIS AND ASSESSMENT OF ELECTRON
112
Dissemination and Updating of the Database
129
ELECTRON INTERACTIONS WITH CF4 C2F6 AND C3Fs
135
Electron Interactions with C2F6
220
Fragments
249
Neutrals
295
References
317
ELECTRON INTERACTIONS WITH CHF3 CF3I
335
AND SF6
449
Electron Interactions with BCl3
574
Electron Interactions with SF6
610
References
729
Index 765
764

Electron Interactions with C3F8
269

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