Chemical Vapor Deposition Polymerization: The Growth and Properties of Parylene Thin Films
Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed.
This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
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DEPOSITION EQUIPMENT 9
Mass Spectrometry for insitu Chemical Analysis and Process
PARYLENEN PRECURSOR CHEMISTRY
OTHER CVD POLYMERS
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Chemical Vapor Deposition Polymerization: The Growth and Properties of ...
Jeffrey B. Fortin,Toh-Ming Lu
No preview available - 2010
104 amu peak adhesion adsorption annealing applications as-deposited base pressure calculated chain end chamber pressure chemical vapor deposition chemisorption Chemisorption model Coating cold trap CVD process depo deposition chamber deposition process deposition rate dielectric constant diffusion pump dimer diradical dissipation factor electron energy equation example deposition system experimental film thickness flow rate fluorinated fragmentation pattern function growth rate heated increase initiation kinetics leakage current material molecule monomer monometer mTorr NIST oligomer p-xylene parameters parylene deposition system parylene family polymers parylene films parylene thin films parylene-N parylene-N films percent physisorption polymerization polynaphthalene film precursor properties pump speed pyrolysis pyrolysis furnace pyrolysis temperature pyrolysis zone reactant reaction reactor shown in figure singlet sition solvent sticking coefficient structure sublimation furnace sublimation tube substrate substrate temperature Teflon Teflon-AF thermal desorption thermal stability thermocouple thickness change tion typical vacuum values valve versus versus film xylene