Thin Film Diamond
A.H. Lettington, J.W. Steeds
Springer Science & Business Media, Dec 6, 2012 - Science - 157 pages
This work, written by leading international authorities, deals with nucleation growth and processing, characterization and electrical, thermal, optical and mechanical properties of thin film diamond. The final chapters are devoted to the broad range of applications of this material.
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Thin film diamond growth mechanisms
Microwave plasma CVD and related techniques for low pressure
Local epitaxial growth of diamond on nickel from the vapour phase 55
The thermal conductivity of CVD diamond films
Strength fracture and erosion properties of CVD diamond
Deposition of diamondlike carbon
Diamond as a wearresistant coating
Thermal and optical applications of thin film diamond 143
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acceptor concentration amorphous carbon Angus Appl Phys Lett applications atomic hydrogen Bachmann Badzian band gap bonding boron chemical vapour deposition coating coefficient Collins CVD diamond CVD diamond films DC plasma defect density deposition area diamond crystals diamond CVD diamond deposition diamond films diamond science diamond surface diamond-like carbon diffusion energy epitaxial flux fraction gas phase germanium graphite Haubner hot filament hot-filament hydrocarbon impact infrared isotopically J E Butler J T Glass Kamo lattice low pressure Materials Research Society Matsumoto mbar measurements mechanism Messier methane methods microwave plasma modulus molecular natural diamond nucleation optical phonon Phys Rev Pittsburgh Materials Research plasma CVD Proc Raman scattering reaction reactor shown in figure silicon spectra spectrum Spitsyn spš stacking errors substrate temperature synthesis synthetic diamond techniques thermal conductivity thickness thin film type IIb diamond velocity